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Combines an FS-1™ Multi-Wavelength Ellipsometer with beam focusing optics and a manual translation stage. The system is deal for manual inspection and quality control measurements on patterned semiconductor wafers.
It performs R&D measurements with small spot size and camera imaging.
Manual translation stage, accommodates 4", 5", and 6" wafer diameters.
Beam size on sample: 0.3 x 0.7 mm.
Video image of beam location on sample
Learn More >Tel: 400-615-4535
Fax: 023-88435169
Email: info@tiaovon.com
Copyright © 2018 Company Name | copyright:Chongqing overlooking Technology Co., Ltd. | Yu ICP is prepared for No. 16012144 -1 | Technical support:PaiChen