Magnetron Sputtering 磁控溅射系统

AJA’s ATC-B Series Batch Coating systems are custom sputtering and evaporation systems, which can batch several kinds of substrates. Customers can choose cylindrical or box chamber according to their different requirements. During film growth, sputtering materials shall not get onto sputtering sources or substrates ( the “get onto” can suspend one process) which obviously enables to increase the number of times of process by horizontal magnetron sputtering.

Engineers of AJA design the standard and custom sputtering sources and substrate holders with extremely experienced skills and techniques to satisfy different requirements, such as ATC-B 3400-H horizontal cylindrical chamber with special sputtering sources to satisfy specific application requirements.