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Laser Ellipsometer 激光椭偏仪

Laser Ellipsometer SE 400advanced 

  1. Description
  2. Specifications
  3. Consultation

Multi-angle laser ellipsometer SE 400 advanced adopts HeNe laser at 632.8nm wavelength, which provide outstanding accuracy of film thickness, refractive index and extinction coefficient, and SE 400 advanced can analyze single- and multi-layer films and layer stacks (basement).

Ultra high precision and stability due to the use of highly steady laser source, temperature stability compensator, Polarization-tracking device and ultra low noise detector.

Sample collimation with height precision trough optical auto-collimation lens and microscope.

Fast and simple measurement with optional mode of application and angle of incidence.

Multi-angle measurement fully in favor of complicate application and accurate thickness

Comprehensive preset function including microelectronics, photo-electricity, magnetic storage, life science and so on.

 

Technical Specifications

Wavelength of laser at 632.8nm

Sample stage at 150mm (z-tilt)

Adjustable angle of incidence, stepping for 5"

Auto-collimation lens/microscope for sample collimation

Small footprint 

Ethernet access port to PC

Option of subtle facula with diameter at 30μm

Sample stage with manual travel in x-y direction within 150mm distance

Option of mapping (x-y direction, distance up to 200mm with vacuum absorption)

Option of video camera in replacement of ocular for sample collimation

Liquid film measurement unit

Option of auto-focus combined with option of mapping

Reflective film thickness gauge, FTP advanced, with facula at 80μm diameter

Dual-wavelength laser (405nm or 1550nm)

SIMULATION Software  

Measurement device for silicon solar cell with rough surface

 

400-615-4535
400-615-4535